The first domestic product! The 100 ton KrF photoresist resin production line has been completed

On July 21st, the first 100 ton semiconductor KrF photoresist resin high automation flexible/mass production dual production line in China, invested and built by 800 million spacetime in Shangyu District, Shaoxing City, was completed. The company stated that after the project reaches production capacity, it is expected to generate revenue of over 100 million yuan; The company will gradually expand its production capacity based on market conditions and plans to have an annual production capacity of 200-300 tons of high-end photoresist resin in the next five years.
800 million time and space disclosure, the company's 100 ton semiconductor KrF photoresist resin high automation flexible/mass production dual production line has complete process conditions and related supporting facilities. After multiple rounds of debugging, all indicators have reached the production standards. With the gradual release of production capacity, 800 million space-time expects to achieve a revenue scale of tens of millions of photoresist resins in the second half of 2025.
According to 800 million spacetime, semiconductor photoresist resin, as the core raw material of photoresist, has a very high technical barrier, mainly in terms of PDI (dispersibility) and purity (metal impurity ppt level) of the resin material. Based on years of systematic advantages and experience in chemical synthesis, material purification, lean management, etc., the company has independently cultivated a professional photoresist resin research and development team. Based on the accumulation of relevant experience in the field of liquid crystal materials and the exploration of core photoresist processes, the company focuses on the research and mass production of PHS resin and its derivatives, a key raw material for KrF photoresist.
The investor relations record table shows that the company's photoresist resin started from scratch, and the R&D team has achieved systematic breakthroughs in key areas such as molecular structure design, synthesis process control, and purification technology through unremitting exploration. They have successfully developed high-performance photoresist resin that meets advanced process requirements, with performance parameters reaching international advanced levels. The company has the R&D and production capabilities for a full range of KrF photoresist resins, and has cooperated with multiple top photoresist manufacturers to develop multiple high-performance resins.